Operating at atmospheric pressure, Microwave-Induced Plasma (MIP) technology avoids over-etching and plasma ion bombardment, unlike acid methods or other plasma processes. Safely analyze copper or silver elements of semiconductors without interference.

𝗗𝗶𝘀𝗰𝗼𝘃𝗲𝗿 𝗮𝗹𝗹 𝘁𝗵𝗲 𝗯𝗲𝗻𝗲𝗳𝗶𝘁𝘀 𝗼𝗳 𝗠𝗜𝗣 𝘁𝗲𝗰𝗵𝗻𝗼𝗹𝗼𝗴𝘆 𝗯𝘆 𝗱𝗼𝘄𝗻𝗹𝗼𝗮𝗱𝗶𝗻𝗴 𝗼𝘂𝗿 𝘄𝗵𝗶𝘁𝗲𝗽𝗮𝗽𝗲𝗿: Here!